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Beamline X15B

General Information

Source Type
Bending Magnet

Status
Operational

General User Beamtime
25%

Energy Range
0.8-15 keV, standard 2-5

Beamline Type
Participating Research Team (PRT)

Technique(s)
X-ray absorption spectroscopy
X-ray absorption spectroscopy, extended fine structure
X-ray absorption spectroscopy, fine structure
X-ray absorption spectroscopy, near edge fine structure
X-ray absorption spectroscopy, near edge structure

Institution(s)
Brookhaven National Laboratory, Environmental Sciences
Corning, Inc.
Georgia Institute of Technology
Lawrence Berkeley National Laboratory
Lucent Technologies, Inc.
Miami University
North Carolina State University
Princeton University
SUNY @ Stony Brook
University of Delaware
Woods Hole Oceanographic Institute

Research Types
X-ray absorption spectroscopy of complex, reactive, very dilute systems. Focus on Environmental Science. Techniques: EXAFS, SEXAFS, NEXAFS.

Contact Information

Spokesperson The person from each beamline who acts as a contact point between the beamline management and NSLS administration. Contact for questions about the beamline scientific program, experimental capabilities, and beamline management.
Paul Northrup, Brookhaven National Laboratory, northrup@bnl.gov, 344-3565

Local Contact The beamline staff member who is typically responsible for overseeing the daily operation and maintenance of the beamline. Contact for questions about beamline instrumentation, experimental details, and training.
Paul Northrup, SUNY @ Stony Brook, northrup@bnl.gov, 631-344-3565

Beamtime Scheduler The beamline staff member responsible for coordination of beamline schedule every trimester. Contact for questions about beamtime scheduling.
Paul Northrup, SUNY @ Stony Brook, northrup@bnl.gov, 631-344-3565

Beamline Phone
631-344-5715

Instrumentation

Beamline Characteristics

Energy Range Mono Crystal or Grating Resolution (ΔE/E) Flux Spot Size (mm) Total Angular Acceptance (mrad)
0.8 – 15 keV (111), Ge(111), Si(220), Si(311), InSb, Beryl 2 x 10-4 ~1 x 1012 ph/sec (@ 250 mA, 2.8 GeV) ~1H x 1V (@ less than 3 keV) 5

Source Type
Bending magnet

Optical System
Mirror 1: Cylindrical platinum coated Glidcop (copper) mirror; mirror is cooled; mirror collimates beam onto first crystal of monochromator; incidence grazing angle (0.4 deg. to 2.7 deg. range) can be adjusted to discriminate against harmonics; located 8 meters from the source.

Monochromator: Double flat crytal UHV-compatible monochromator with fixed-exit geometry; first crystal is cooled; Bragg angle range from 10 deg. to 80 deg.; located 10 meters from the source.

Mirror 2: 1:1 focusing platinum coated ULE (fused silica) toroidal mirror for focusing beam onto sample in UHV chamber 22 meters from source with 0.4 deg. incidence grazing angle. Changing this angle slightly refocuses beam more than 22 meters into present Hutch Box or into a General User-supplied end station/UHV chamber.

Experimental Apparatus
An ultra-high vacuum chamber is available for use by highly-qualified users under supervision of beamline personnel. Contact Spokesperson for specifications. A small Hutch Box, with air or He atmosphere, is equipped with a Ge fluorescence detector, ion chambers, LN2-cooled sample stage, and He cryostat. Operating range is 2-15 keV. An independent end station supplied by the General User and approved by the X15B Spokesperson may be installed downstream of the existing UHV chamber. Contact Spokesperson for details.

Computer System Hardware & Software
PC386 and Pentium computers with Windows 95, floppy, Jaz and Zip drives; associated software and graphics.

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