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Beamline X1B

General Information

Source Type
Insertion Device

Status
Operational

General User Beamtime
25%

Energy Range Category
Soft X-Ray (0.1-1 keV)

Energy Range
.2-1.6 keV

Beamline Type
Participating Research Team (PRT)

Technique(s)
X-ray absorption spectroscopy
X-ray fluorescence spectroscopy
X-ray photoelectron spectroscopy

Institution(s)
Boston University
Thomas Jefferson National Accelerator Facility
University of Illinois

Research Types
At present, the scientific programs on X1B include resonant soft X-ray scattering, photoemission,x-ray emission spectroscopy, resonant inelastic x-ray scattering, and coherent imaging.

Contact Information

Spokesperson The person from each beamline who acts as a contact point between the beamline management and NSLS administration. Contact for questions about the beamline scientific program, experimental capabilities, and beamline management.
Peter Abbamonte, University of Illinois @ Urbana-Champaign, abbamonte@mrl.uiuc.edu, (217)244-4861
Kevin Smith, Boston University, ksmith@buphy.bu.edu, 617/353-6117

Local Contact The beamline staff member who is typically responsible for overseeing the daily operation and maintenance of the beamline. Contact for questions about beamline instrumentation, experimental details, and training.
Louis Piper, Boston University, lfjpiper@physics.bu.edu, 6313445701
Serban Smadici, University of Illinois @ Urbana-Champaign, smadici@bnl.gov, 6313445701

Beamtime Scheduler The beamline staff member responsible for coordination of beamline schedule every trimester. Contact for questions about beamtime scheduling.
Peter Abbamonte, University of Illinois @ Urbana-Champaign, abbamonte@mrl.uiuc.edu, (217)244-4861

Beamline Phone
631-344-5701

Instrumentation

Beamline Characteristics

Energy Range Mono Crystal or Grating Resolution (ΔE/E) Flux Spot Size (mm) Total Angular Acceptance (mrad)
8 – 120 300, 600, 1200, 1600 lines/mm >=10-4 1 x 1018 ph/(sec-0.1%bw-mm2-mrad2) 2.0H x 0.050V(endstation A), 0.1H x 0.03V (endstation B)  

Source Type
35 period planar undulator, minimum gap 32 mm

Optical System
Mirror 1: Cylindrical focusing aluminum mirror coated with electroless nickel and gold; 2.5 degree angle of incidence; water-cooled; focuses undulator source horizontally onto sample; located 14.21 meters from the source.

Mirror 2: Cylindrical focusing silicon mirror coated with gold; 2.5 degree angle of incidence; water cooled; 5:1 demagnification; focuses undulator source vertically onto entrance slit of monochromator; located 14.47 meters from the source.

Monochromator: Spherical grating monochromator with water cooled entrance slit (located 17.36 m from source) and moveable exit slit (located 23.5-24.4 m from source); four gold-coated silicon water-cooled spherical gratings, line densities 300, 600, 1200, and 1600 per mm
(located 19.56 m from source). Total deflection angle is 6.6 degrees.

Refocusing Mirror: Gold-coated silicon ellipsoidal mirror, ~5:1 demagnification, located 29.6 m from source. Focal spot (~100 microns(h) x ~30 microns(v)) is located 30.6 m from source.

Experimental Apparatus
Two endstations are currently available, for (1) soft x-ray scattering, located ~26 m from source and (2) soft x-ray emission and ARPES, located ~31 m from source. Endstation (2) utilizes the focused soft x-ray spot produced by the refocusing mirror.

Computer System Hardware & Software
Instrument interfacing done with VME; front end via a Linux machine running Spec; several PC's with Labview exist for specialized tasks; cable and wireless network access.

Links