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X26A External Homepage

Beamline X26A

General Information

Source Type
Bending Magnet

Status
Operational

General User Beamtime
25%

Energy Range
3-30 keV

Beamline Type
Participating Research Team (PRT)

Technique(s)
Microdiffraction Imaging
X-ray microprobe

Institution(s)
Brookhaven National Laboratory, Enironmental Sciences
University of Chicago
University of Kentucky, College of Agriculture

Research Types
Develop and apply a synchrotron-based x-ray microprobe. Techniques: Synchrotron x-ray fluorescence microanalysis, microspectroscopy (including XAS), and microdiffraction in geochemistry, environmental science, chemistry, biology, and other fields.

Contact Information

Spokesperson The person from each beamline who acts as a contact point between the beamline management and NSLS administration. Contact for questions about the beamline scientific program, experimental capabilities, and beamline management.
Stephen Sutton, University of Chicago, Sutton@cars.uchicago.edu, 6302520426

Local Contact The beamline staff member who is typically responsible for overseeing the daily operation and maintenance of the beamline. Contact for questions about beamline instrumentation, experimental details, and training.
Antonio Lanzirotti, University of Chicago, lanzirotti@bnl.gov, 631-344-7174 (BNL)

Beamtime Scheduler The beamline staff member responsible for coordination of beamline schedule every trimester. Contact for questions about beamtime scheduling.
Antonio Lanzirotti, University of Chicago, lanzirotti@bnl.gov, 631-344-7174 (BNL)

Beamline Phone
631-344-5626

Instrumentation

Beamline Characteristics

Energy Range Mono Crystal or Grating Resolution (ΔE/E) Flux Spot Size (mm) Total Angular Acceptance (mrad)
3 – 40 keV Unfocused White Beam   unmeasured 25H x 2V 3.0
4 - 18 keV Focused White Beam   unmeasured 0.15H x 0.35V 0.5
4 - 30 keV Unfocused Mono, Si(111) and Si(311) 2 x -4 unmeasured 25H x 2V 3.0
4 - 30 keV Focused Mono, Si(111) and Si(311) 2 x -4 3 x 9 ph/sec 0.011H x 0.005V 0.5

Source Type
Bending magnet

Optical System
Microfocusing optics consisting of two, 100 mm long, dynamically bent silica mirrors arranged in a Kirkpatrick-Baez (KB) geometry (designed and built by P. Eng, CARS-University of Chicago). The KB mirrors (40:1, 9 meters from the source) focus a 400 x 400 m beam down to about 5-10 m (FWHM) resulting in a gain in flux/µm^2 of about 1500 over a pinhole. Photon Flux at 18 keV is roughly 1x109 photons/sec in focused monochromatic mode. The focusing mirrors are Rh coated and reside inside a He enclosure. The beamline can also be operated using a pinhole collimator (~5 m beam) or an 8:1 ellipsoidal focusing mirror (~150 m beam).

Experimental Apparatus
Radiation hutch; 9-element Ge Array and Si(Li) x-ray detectors, both Canberra, using either XIA DXP digital multi channel analyzer systems or 9615/AIM analog electronics; Ion chamber and PIN diode detectors; Wavelength dispersive spectrometer (deltaE/E ~ 10-3); XYZ-theta sample position stage; Remote optical microscope with Mitutoyo infinity-corrected long working distance objectives; Microdiffraction capabilities using Bruker SMART 1500 CCD detector.

Computer System Hardware & Software
Three PC workstations operating Windows NT, 2000, and XP Pro OS systems, fastest operating at 3 GHz w/ 1 GHz RAM. One Apple Power Mac G5 (Power PC 970, 1.6 GHz) using Mac OS X Panther as EPICS boot host. Hard disk, CD-R/W, DVD-R/W, USB 2.0 Multi-Card Reader, 20Gb Travan tape data storage options. EPICS Control System using an MEDM front-end. VME and CAMAC system monitors, Ethernet data access and acquisition, Interactive Data Language (IDL) software, optical and digital image capture and processing system with hardcopy. Bruker SMART diffractometer control system.

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