Workshop #5 at the NSLS Users' Meeting

Advanced Optical Systems and Metrology for High Power and Coherent Beamlines

Location: Bldg. 555, Chemistry, Hamilton

Date: May 19, 2004

Organizers:
Peter Takacs, BNL (takacs@bnl.gov)
Steve Hulbert, BNL (hulbert1@bnl.gov)

Description: The extreme brightness and ultra-low emittance of the NSLS II and other next-generation light sources present significant challenges to users in the design of optical systems that take advantage of these unique x-ray beam qualities. This workshop will investigate the design, fabrication, and testing issues involved in developing beam line optical components to meet these challenges. Current state-of-the-art manufacturing processes can produce large mirrors with surface slope errors in the 0.5 µrad range. New mirrors will be required with slope errors below the 100 nrad level over large areas in order not to degrade the coherence properties of the source. Handling the large power densities from the small source size will require novel materials and designs for cooled optics to keep surface distortions to a minimum.

Schedule:

Session 1 - 8:25 a.m.
8:30 a.m. Chris Jacobsen
"Optics for coherence"
9:00 a.m. John S. Taylor
"X-ray microscope optics"
9:30 a.m. Phil Stahl
"Optical Technology Needs for Future NASA Telescope Missions"
10:00 a.m. Break
Session 2 - 10:30 a.m.
10:30 a.m. Don Golini
"Magnetorheological finishing technology"
11:00 a.m. Ken Evans-Lutterodt
"Refractive x-ray optics"
11:30 a.m. Ali Khounsary
"High heat load optics"
12:00 noon Lunch
Session 3 - 1:00 p.m.
1:00 p.m. PZ Takacs
"Current limits of surface profilometry"
1:30 p.m. Wayne McKinney
"SR optics metrology issues"
2:00 p.m. Shinan Qian
"In-situ profilometry"
2:30 p.m. Break
Session 4 - 3:00 p.m.
3:00 p.m. Gene Ice
"KB mirrors, nanoprobes, and differential coating technology"
3:30 p.m. Riccardo Signorato
"Modular Piezoelectric Bimorph Mirrors - Adaptive Optics in the X-ray Domain"
4:00 p.m. Dan Hausermann
"Adaptive optics experience"
4:30 p.m. General Discussion, Summary
5:00 p.m. Adjourn. Optional tour of the Optical Metrology Laboratory, Bldg. 535