Workshop #5 at the NSLS Users' Meeting
Advanced Optical Systems and Metrology for High Power and Coherent Beamlines
Location: Bldg. 555, Chemistry, Hamilton
Date: May 19, 2004
Organizers:
Peter Takacs, BNL (takacs@bnl.gov)
Steve Hulbert, BNL (hulbert1@bnl.gov)
Description: The extreme brightness and ultra-low emittance of the NSLS II and other next-generation
light sources present significant challenges to users in the design of optical systems that take advantage of
these unique x-ray beam qualities. This workshop will investigate the design, fabrication, and testing issues
involved in developing beam line optical components to meet these challenges. Current state-of-the-art manufacturing
processes can produce large mirrors with surface slope errors in the 0.5 µrad range. New mirrors will be required with
slope errors below the 100 nrad level over large areas in order not to degrade the coherence properties of the
source. Handling the large power densities from the small source size will require novel materials and designs for
cooled optics to keep surface distortions to a minimum.
Schedule:
| Session 1 - 8:25 a.m. |
| 8:30 a.m. |
Chris Jacobsen "Optics for coherence" |
| 9:00 a.m. |
John S. Taylor "X-ray microscope optics" |
| 9:30 a.m. |
Phil Stahl "Optical Technology Needs for Future NASA
Telescope Missions" |
| 10:00 a.m. |
Break |
| Session 2 - 10:30 a.m. |
| 10:30 a.m. |
Don Golini "Magnetorheological finishing technology" |
| 11:00 a.m. |
Ken Evans-Lutterodt "Refractive x-ray optics" |
| 11:30 a.m. |
Ali Khounsary "High heat load optics" |
| 12:00 noon |
Lunch |
| Session 3 - 1:00 p.m. |
| 1:00 p.m. |
PZ Takacs "Current limits of surface profilometry" |
| 1:30 p.m. |
Wayne McKinney "SR optics metrology issues" |
| 2:00 p.m. |
Shinan Qian "In-situ profilometry" |
| 2:30 p.m. |
Break |
| Session 4 - 3:00 p.m. |
| 3:00 p.m. |
Gene Ice "KB mirrors, nanoprobes, and
differential coating technology" |
| 3:30 p.m. |
Riccardo Signorato "Modular Piezoelectric Bimorph
Mirrors - Adaptive Optics in the X-ray Domain" |
| 4:00 p.m. |
Dan Hausermann "Adaptive optics experience" |
| 4:30 p.m. |
General Discussion, Summary |
| 5:00 p.m. |
Adjourn. Optional tour of the Optical Metrology
Laboratory, Bldg. 535 |
|