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Workshop 8

"Making and Using Nanobeams"

Date: Wednesday, May 23, 2007

Organizer(s):
Ismail Noyan (Columbia University) icn2@columbia.edu
Kenneth Evans- Lutterodt (National Synchrotron Light Source), kenne@bnl.gov

Location: Bldg. 488, Berkner Hall, Auditorium

Description:
Part I: Optics and Instrumentation for Nanobeams
This workshop is intended to highlight the art of forming small-diameter x-ray beams, their integration into workable scattering instruments and the science enabled by these advances.

Part II: Applications
This workshop is intended to highlight the applications of small-diameter x-ray beams in materials characterization. The first part of the workshop, application of nanobeams to microelectronic devices will be held jointly with the Applications of Synchrotron Based Methods to Microelectronics Materials. In the second part, applications to biological materials and challenges in nanobeam analysis will be discussed.

 

Agenda
8:50 a.m. - 9:00 a.m. Welcome
9:00 a.m. - 9:40 a.m. Dr. Jörg Maser, Center for Nanoscale Materials, Argonne National Laboratory, Advanced Photon Source, Argonne National Laboratory
“Addressing Nanosciences with High-resolution X-ray Microscopy: Next-Generation Tools, Future Focusing Optics, and their Application"
9:40 a.m. - 10:30 a.m. Prof. Don Bilderback, Associate Director, CHESS, Cornell University
“Optimizing Monocapillary Optics for Synchrotron X-ray Diffraction, Fluorescence Imaging, and Spectroscopy Applications and Possible Extensions to an Energy Recovery Linac Source of X-Rays”
10:30 a.m - 11:00 a.m Break
11:00 a.m. - 11:40 a.m. Dr. Aaron Stein, Center for Functional Nanomaterials, Brookhaven National Laboratory
“Fabrication of Silicon Kinoform lenses for Hard X-ray Focusing by Electron Beam Lithography and Deep Reactive Ion Etching”
11:40 a.m. - 12:10 p.m. Dr. Nobumichi Tamura, Advanced Light Source
“X-ray Microdiffraction Study of Electromigration Induced Plasticity in Al and Cu Interconnects”
  Lunch
  The first part of the afternoon session, “Application of Nanobeams to Microelectronic Devices” will be held jointly with the “Microelectronic Materials, Application and Imaging Workshop”. In the second part, applications to biological materials, microbeam x-ray spectroscopy and software available for nanobeam analysis will be discussed.
  Note: First afternoon session is a joint session with workshop 9, “Microelectronic Materials, Application and Imaging Workshop"
1:10 p.m. - 1:50 p.m. Michael Feser, Xradia, Inc.
“Applications of Synchrotron Based Methods to Microelectronic Materials”
1:50 p.m. - 2:30 p.m. Dr. Conal E. Murray, IBM Research Division, T. J. Watson Laboratory
“The Mechanics of Strained-Si Microelectronics as Revealed by Microbeam X-ray Diffraction”
2:30 p.m. - 3:10 p.m. Dr. Tonio Buonassisi, Evergreen Solar, Inc., Marlborough, MA
“Nanodefect Engineering in Silicon Solar Cells”
3:10 p.m. - 3:30 p.m. Break
3:30 p.m. - 4:10 p.m. Dr. James Ablett, National Synchrotron Light Source, Brookhaven National Laboratory
“Selected Applications of Hard X-ray Micro-Spectroscopy”
4:10 p.m. - 4: 50 p.m. Dr. Stefan Vogt, X-ray Science Division, Advanced Photon Source, Argonne National Laboratory
“Micro and NanoBeam Characterization of Biological Samples”
4:50 p.m. - 5:30 p.m. Sean Polvino, Dept. of Applied Physics and Applied Mathematics, School of Engineering and Applied Science, Columbia University
“XMAS: The Powerful Free Software for the Analysis of Laue Microbeam Images”